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Information card for entry 4115530
Preview
Coordinates | 4115530.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C25.33333 H16.33333 Cl N4 O8 |
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Calculated formula | C25.3333 H16.3333 Cl N4 O8 |
SMILES | C(Cl)(Cl)Cl.C(c1ccc(cc1)N(=O)=O)(c1ccc(N(=O)=O)cc1)(c1ccc(N(=O)=O)cc1)c1ccc(N(=O)=O)cc1 |
Title of publication | Inclusion Compounds of Tetrakis(4-nitrophenyl)methane: C-H...O Networks, Pseudopolymorphism, and Structural Transformations |
Authors of publication | Ram Thaimattam; Feng Xue; Jagarlapudi A. R. P. Sarma; Thomas C. W. Mak; Gautam R. Desiraju |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2001 |
Journal volume | 123 |
Pages of publication | 4432 - 4445 |
a | 22.276 ± 0.001 Å |
b | 22.276 ± 0.001 Å |
c | 25.348 ± 0.001 Å |
α | 90° |
β | 90° |
γ | 120° |
Cell volume | 10893 ± 0.8 Å3 |
Cell temperature | 293 ± 2 K |
Ambient diffraction temperature | 293 ± 2 K |
Number of distinct elements | 5 |
Space group number | 148 |
Hermann-Mauguin space group symbol | R -3 :H |
Hall space group symbol | -R 3 |
Residual factor for all reflections | 0.1455 |
Residual factor for significantly intense reflections | 0.0483 |
Weighted residual factors for all reflections | 0.1616 |
Weighted residual factors for significantly intense reflections | 0.1331 |
Goodness-of-fit parameter for all reflections | 1.036 |
Goodness-of-fit parameter for significantly intense reflections | 1.284 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4115530.html
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