Information card for entry 4117744
| Chemical name |
1,1,1,3,3,3-hexa-tert-butyltrisilane-2,2-diyl 1',3',4',5'-tetramethyl-2',3'-dihydro-1'H-imidazole-2',2'-diyl complex |
| Formula |
C35 H74 N2 O Si3 |
| Calculated formula |
C35 H74 N2 O Si3 |
| SMILES |
[Si]([Si](C(C)(C)C)(C(C)(C)C)C(C)(C)C)([Si](C(C)(C)C)(C(C)(C)C)C(C)(C)C)=C1N(C(=C(N1C)C)C)C.O1CCCC1 |
| Title of publication |
An Isolable NHC-Stabilized Silylene Radical Cation: Synthesis and Structural Characterization |
| Authors of publication |
Hiroaki Tanaka; Masaaki Ichinohe; Akira Sekiguchi |
| Journal of publication |
Journal of the American Chemical Society |
| Year of publication |
2012 |
| Journal volume |
134 |
| Pages of publication |
5540 - 5543 |
| a |
15.7355 ± 0.0007 Å |
| b |
16.2056 ± 0.0008 Å |
| c |
30.5406 ± 0.0014 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
7788 ± 0.6 Å3 |
| Cell temperature |
120 ± 1 K |
| Ambient diffraction temperature |
120 ± 1 K |
| Number of distinct elements |
5 |
| Space group number |
19 |
| Hermann-Mauguin space group symbol |
P 21 21 21 |
| Hall space group symbol |
P 2ac 2ab |
| Residual factor for all reflections |
0.082 |
| Residual factor for significantly intense reflections |
0.0661 |
| Weighted residual factors for significantly intense reflections |
0.2032 |
| Weighted residual factors for all reflections included in the refinement |
0.2133 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.027 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4117744.html