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Information card for entry 4121724
Preview
| Coordinates | 4121724.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C26 H44 B2 Fe O6 Si2 |
|---|---|
| Calculated formula | C26 H44 B2 Fe O6 Si2 |
| SMILES | B1(O[Si]([c]23[cH]4[cH]5[cH]6[cH]2[Fe]27893456[c]3([cH]9[cH]8[cH]7[cH]23)[Si](C)(C)OB2OC(C(O2)(C)C)(C)C)(C)C)OC(C(O1)(C)C)(C)C |
| Title of publication | Selective boryl silyl ether formation in the photoreaction of bisboryloxide/boroxine with hydrosilane catalyzed by a transition-metal carbonyl complex. |
| Authors of publication | Ito, Masaki; Itazaki, Masumi; Nakazawa, Hiroshi |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2014 |
| Journal volume | 136 |
| Journal issue | 17 |
| Pages of publication | 6183 - 6186 |
| a | 10.523 ± 0.005 Å |
| b | 11.722 ± 0.005 Å |
| c | 12.562 ± 0.006 Å |
| α | 90° |
| β | 94.948 ± 0.005° |
| γ | 90° |
| Cell volume | 1543.8 ± 1.2 Å3 |
| Cell temperature | 200 ± 2 K |
| Ambient diffraction temperature | 200 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0662 |
| Residual factor for significantly intense reflections | 0.0583 |
| Weighted residual factors for significantly intense reflections | 0.1183 |
| Weighted residual factors for all reflections included in the refinement | 0.1218 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.222 |
| Diffraction radiation wavelength | 0.7107 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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