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Information card for entry 4121818
Preview
| Coordinates | 4121818.cif |
|---|---|
| Original paper (by DOI) | HTML |
| External links | PubChem |
| Formula | C54 H58 Si2 |
|---|---|
| Calculated formula | C54 H58 Si2 |
| SMILES | c1c2ccccc2cc2c1c(c1c3c2ccc2c(c4cc5ccccc5cc4c(c32)cc1)C#C[Si](C(C)C)(C(C)C)C(C)C)C#C[Si](C(C)C)(C(C)C)C(C)C |
| Title of publication | Bistetracene: an air-stable, high-mobility organic semiconductor with extended conjugation. |
| Authors of publication | Zhang, Lei; Fonari, Alexandr; Liu, Yao; Hoyt, Andra-Lisa M; Lee, Hyunbok; Granger, Devin; Parkin, Sean; Russell, Thomas P.; Anthony, John E.; Brédas, Jean-Luc; Coropceanu, Veaceslav; Briseno, Alejandro L. |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2014 |
| Journal volume | 136 |
| Journal issue | 26 |
| Pages of publication | 9248 - 9251 |
| a | 8.9841 ± 0.0011 Å |
| b | 9.7368 ± 0.0016 Å |
| c | 13.51 ± 0.002 Å |
| α | 75.34 ± 0.014° |
| β | 70.337 ± 0.013° |
| γ | 90.051 ± 0.014° |
| Cell volume | 1071.8 ± 0.3 Å3 |
| Cell temperature | 90 ± 0.2 K |
| Ambient diffraction temperature | 90 ± 0.2 K |
| Number of distinct elements | 3 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.132 |
| Residual factor for significantly intense reflections | 0.1053 |
| Weighted residual factors for significantly intense reflections | 0.2322 |
| Weighted residual factors for all reflections included in the refinement | 0.2496 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.083 |
| Diffraction radiation wavelength | 1.54178 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4121818.html
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