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Information card for entry 4122260
Preview
| Coordinates | 4122260.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | Sc3C2@Ih(7)-C80/Ni(OEP)/1.5(benzene)/1.0(CS2) |
|---|---|
| Formula | C128 H53 N4 Ni S2 Sc3 |
| Calculated formula | C128 H53 N4 Ni S2 Sc3 |
| Title of publication | Regioselective Benzyl Radical Addition to an Open-Shell Cluster Metallofullerene. Crystallographic Studies of Cocrystallized Sc3C2@Ih-C80 and Its Singly Bonded Derivative. |
| Authors of publication | Fang, Hongyun; Cong, Hailin; Suzuki, Mitsuaki; Bao, Lipiao; Yu, Bing; Xie, Yunpeng; Mizorogi, Naomi; Olmstead, Marilyn M.; Balch, Alan L.; Nagase, Shigeru; Akasaka, Takeshi; Lu, Xing |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2014 |
| Journal volume | 136 |
| Journal issue | 29 |
| Pages of publication | 10534 - 10540 |
| a | 26.788 ± 0.003 Å |
| b | 16.9531 ± 0.0019 Å |
| c | 17.6337 ± 0.0017 Å |
| α | 90° |
| β | 106.517 ± 0.006° |
| γ | 90° |
| Cell volume | 7677.7 ± 1.4 Å3 |
| Cell temperature | 90 ± 2 K |
| Ambient diffraction temperature | 90 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 12 |
| Hermann-Mauguin space group symbol | C 1 2/m 1 |
| Hall space group symbol | -C 2y |
| Residual factor for all reflections | 0.1133 |
| Residual factor for significantly intense reflections | 0.0813 |
| Weighted residual factors for significantly intense reflections | 0.2206 |
| Weighted residual factors for all reflections included in the refinement | 0.2501 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.06 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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Users of the data should acknowledge the original authors of the
structural data.