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Information card for entry 4122333
Preview
Coordinates | 4122333.cif |
---|---|
Original paper (by DOI) | HTML |
Chemical name | {C6H10}{B(NArCH)2}2 |
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Formula | C58 H82 B2 N4 |
Calculated formula | C58 H82 B2 N4 |
SMILES | B1(N(C=CN1c1c(C(C)C)cccc1C(C)C)c1c(cccc1C(C)C)C(C)C)C/C(=C(CB1N(C=CN1c1c(cccc1C(C)C)C(C)C)c1c(cccc1C(C)C)C(C)C)\C)C |
Title of publication | Oxidative Bond Formation and Reductive Bond Cleavage at Main Group Metal Centers: Reactivity of Five-Valence-Electron MX2 Radicals. |
Authors of publication | Protchenko, Andrey V.; Dange, Deepak; Blake, Matthew P.; Schwarz, Andrew D.; Jones, Cameron; Mountford, Philip; Aldridge, Simon |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2014 |
Journal volume | 136 |
Journal issue | 31 |
Pages of publication | 10902 - 10905 |
a | 24.2497 ± 0.0004 Å |
b | 12.5615 ± 0.0001 Å |
c | 19.5541 ± 0.0003 Å |
α | 90° |
β | 113.287 ± 0.0017° |
γ | 90° |
Cell volume | 5471.19 ± 0.15 Å3 |
Cell temperature | 150 K |
Ambient diffraction temperature | 150 K |
Number of distinct elements | 4 |
Space group number | 15 |
Hermann-Mauguin space group symbol | C 1 2/c 1 |
Hall space group symbol | -C 2yc |
Residual factor for all reflections | 0.0499 |
Residual factor for significantly intense reflections | 0.0451 |
Weighted residual factors for all reflections | 0.0669 |
Weighted residual factors for significantly intense reflections | 0.0606 |
Weighted residual factors for all reflections included in the refinement | 0.0595 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.0511 |
Diffraction radiation wavelength | 1.5418 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4122333.html
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Users of the data should acknowledge the original authors of the
structural data.