Information card for entry 4124182
| Formula |
C79 H82 Cl Cu N4 O15 |
| Calculated formula |
C79 H82 Cl Cu N4 O15 |
| Title of publication |
Electron Injection from Copper Diimine Sensitizers into TiO2: Structural Effects and Their Implications for Solar Energy Conversion Devices. |
| Authors of publication |
Mara, Michael W.; Bowman, David N.; Buyukcakir, Onur; Shelby, Megan L.; Haldrup, Kristoffer; Huang, Jier; Harpham, Michael R.; Stickrath, Andrew B.; Zhang, Xiaoyi; Stoddart, J. Fraser; Coskun, Ali; Jakubikova, Elena; Chen, Lin X. |
| Journal of publication |
Journal of the American Chemical Society |
| Year of publication |
2015 |
| Journal volume |
137 |
| Journal issue |
30 |
| Pages of publication |
9670 - 9684 |
| a |
12.7999 ± 0.0006 Å |
| b |
15.1536 ± 0.0008 Å |
| c |
36.6934 ± 0.0018 Å |
| α |
90° |
| β |
94.913 ± 0.003° |
| γ |
90° |
| Cell volume |
7091.1 ± 0.6 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
6 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.1582 |
| Residual factor for significantly intense reflections |
0.1436 |
| Weighted residual factors for significantly intense reflections |
0.3309 |
| Weighted residual factors for all reflections included in the refinement |
0.3362 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.146 |
| Diffraction radiation wavelength |
1.54178 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
No |
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