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Information card for entry 4125015
Preview
Coordinates | 4125015.cif |
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Original paper (by DOI) | HTML |
Formula | C47 H72 B N3 Si Sn |
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Calculated formula | C47 H72 B N3 Si Sn |
SMILES | [Sn]1(N(c2c(cccc2C(C)C)C(C)C)[Si](C)(C)C)(CC(=C(C1)C)C)B1N(C=CN1c1c(cccc1C(C)C)C(C)C)c1c(cccc1C(C)C)C(C)C |
Title of publication | Enabling and Probing Oxidative Addition and Reductive Elimination at a Group 14 Metal Center: Cleavage and Functionalization of E-H Bonds by a Bis(boryl)stannylene. |
Authors of publication | Protchenko, Andrey V.; Bates, Joshua I.; Saleh, Liban M. A.; Blake, Matthew P.; Schwarz, Andrew D.; Kolychev, Eugene L.; Thompson, Amber L.; Jones, Cameron; Mountford, Philip; Aldridge, Simon |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2016 |
Journal volume | 138 |
Journal issue | 13 |
Pages of publication | 4555 - 4564 |
a | 11.3662 ± 0.0001 Å |
b | 19.9462 ± 0.0002 Å |
c | 20.7654 ± 0.0003 Å |
α | 90° |
β | 91.3439 ± 0.001° |
γ | 90° |
Cell volume | 4706.48 ± 0.09 Å3 |
Cell temperature | 150 K |
Ambient diffraction temperature | 150 K |
Number of distinct elements | 6 |
Space group number | 4 |
Hermann-Mauguin space group symbol | P 1 21 1 |
Hall space group symbol | P 2yb |
Residual factor for all reflections | 0.0489 |
Residual factor for significantly intense reflections | 0.0483 |
Weighted residual factors for all reflections | 0.0518 |
Weighted residual factors for significantly intense reflections | 0.0515 |
Weighted residual factors for all reflections included in the refinement | 0.0514 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.0186 |
Diffraction radiation wavelength | 1.5418 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4125015.html
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