Information card for entry 4127746

Structure parameters

• Formula: C65 H77 B N4 O Si3
• Calculated formula: C65 H77 B N4 O Si3
• SMILES: [Si]1([Si]2([N](=C(N2C(C)(C)C)c2ccccc2)C(C)(C)C)c2c3Oc4c([Si]51[N](=C(N5C(C)(C)C)c1ccccc1)C(C)(C)C)cccc4C(c3ccc2)(C)C)CC[B](c1ccccc1)(c1ccccc1)c1ccccc1
• Title of publication: Synthesis of an Isolable Bis(silylene)-Stabilized Silylone and Its Reactivity Toward Small Gaseous Molecules.
• Authors of publication: Wang, Yuwen; Karni, Miriam; Yao, Shenglai; Kaushansky, Alexander; Apeloig, Yitzhak; Driess, Matthias
• Journal of publication: Journal of the American Chemical Society
• Year of publication: 2019
• Journal volume: 141
• Journal issue: 32
• Pages of publication: 12916 - 12927
• a: 12.7519 ± 0.0005 Å
• b: 13.089 ± 0.0005 Å
• c: 18.6644 ± 0.0007 Å
• α: 87.583 ± 0.003°
• β: 83.914 ± 0.003°
• γ: 71.068 ± 0.004°
• Cell volume: 2930 ± 0.2 ų
• Cell temperature: 150 ± 2 K
• Ambient diffraction temperature: 150 ± 2 K
• Number of distinct elements: 6
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.097
• Residual factor for significantly intense reflections: 0.0786
• Weighted residual factors for significantly intense reflections: 0.2082
• Weighted residual factors for all reflections included in the refinement: 0.233
• Goodness-of-fit parameter for all reflections included in the refinement: 1.035
• Diffraction radiation wavelength: 1.54184 Å
• Diffraction radiation type: CuKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No