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Information card for entry 4131771
Preview
Coordinates | 4131771.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C104 H110 Bi Cl N2 O Si2 |
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Calculated formula | C104 H110 Bi Cl N2 O Si2 |
SMILES | [Bi]1(Cl)N([Si](O[Si](N1c1c(cc(cc1C(c1ccccc1)c1ccccc1)C(C)(C)C)C(c1ccccc1)c1ccccc1)(C)C)(C)C)c1c(cc(cc1C(c1ccccc1)c1ccccc1)C(C)(C)C)C(c1ccccc1)c1ccccc1.c1(ccccc1)C.c1(ccccc1)C.c1(ccccc1)C.c1(ccccc1)C |
Title of publication | Bismuth(III) Complex of the [S<sub>4</sub>]<sup>•-</sup> Radical Anion: Dimer Formation via Pancake Bonds. |
Authors of publication | Schwamm, Ryan J.; Lein, Matthias; Coles, Martyn P.; Fitchett, Christopher M. |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2017 |
Journal volume | 139 |
Journal issue | 46 |
Pages of publication | 16490 - 16493 |
a | 18.0673 ± 0.0003 Å |
b | 19.7078 ± 0.0003 Å |
c | 24.446 ± 0.0004 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 8704.4 ± 0.2 Å3 |
Cell temperature | 120 ± 0.1 K |
Ambient diffraction temperature | 120 ± 0.1 K |
Number of distinct elements | 7 |
Space group number | 19 |
Hermann-Mauguin space group symbol | P 21 21 21 |
Hall space group symbol | P 2ac 2ab |
Residual factor for all reflections | 0.0307 |
Residual factor for significantly intense reflections | 0.026 |
Weighted residual factors for significantly intense reflections | 0.0527 |
Weighted residual factors for all reflections included in the refinement | 0.0547 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.036 |
Diffraction radiation probe | x-ray |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4131771.html
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Users of the data should acknowledge the original authors of the
structural data.