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Information card for entry 4133879
Preview
Coordinates | 4133879.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C56 H132 N2 O19 V6 |
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Calculated formula | C56 H132 N2 O19 V6 |
SMILES | C(C)[O]1[V]234(=O)[O](CC)[V]567(=O)[O](CC)[V]891(=O)[O]1%1046[V]4(=O)([O](CC)[V]1([O]2CC)([O]5CC)(=O)[O](CC)[V]%10([O]3CC)(=O)([O]4CC)[O]9CC)([O]8CC)[O]7CC.[N+](CCCC)(CCCC)(CCCC)CCCC.[N+](CCCC)(CCCC)(CCCC)CCCC |
Title of publication | Site-Selective Halogenation of Polyoxovanadate Clusters: Atomically Precise Models for Electronic Effects of Anion Doping in VO2. |
Authors of publication | Petel, Brittney E.; Meyer, Rachel L.; Maiola, Michela L.; Brennessel, William W.; Müller, Astrid M; Matson, Ellen M. |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2019 |
a | 19.0957 ± 0.0003 Å |
b | 18.7627 ± 0.0003 Å |
c | 20.0038 ± 0.0003 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 7167.1 ± 0.19 Å3 |
Cell temperature | 100 ± 0.1 K |
Ambient diffraction temperature | 100 ± 0.1 K |
Number of distinct elements | 5 |
Space group number | 61 |
Hermann-Mauguin space group symbol | P b c a |
Hall space group symbol | -P 2ac 2ab |
Residual factor for all reflections | 0.0404 |
Residual factor for significantly intense reflections | 0.0352 |
Weighted residual factors for significantly intense reflections | 0.0931 |
Weighted residual factors for all reflections included in the refinement | 0.0961 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.076 |
Diffraction radiation probe | x-ray |
Diffraction radiation wavelength | 1.54184 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4133879.html
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Users of the data should acknowledge the original authors of the
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