Information card for entry 4134529
Formula |
Cs F O7 P2 Si |
Calculated formula |
Cs F O7 P2 Si |
Title of publication |
Designing a Deep-UV Nonlinear Optical Fluorooxosilicophosphate. |
Authors of publication |
Ding, Qingran; Liu, Xiaomeng; Zhao, Sangen; Wang, Yusong; Li, Yanqiang; Li, Lina; Liu, Shuai; Lin, Zheshuai; Hong, Maochun; Luo, Junhua |
Journal of publication |
Journal of the American Chemical Society |
Year of publication |
2020 |
a |
4.5525 ± 0.0009 Å |
b |
7.9999 ± 0.0016 Å |
c |
9.5565 ± 0.0019 Å |
α |
90° |
β |
99.77 ± 0.03° |
γ |
90° |
Cell volume |
343 ± 0.12 Å3 |
Cell temperature |
200 ± 2 K |
Ambient diffraction temperature |
200 K |
Number of distinct elements |
5 |
Space group number |
4 |
Hermann-Mauguin space group symbol |
P 1 21 1 |
Hall space group symbol |
P 2yb |
Residual factor for all reflections |
0.065 |
Residual factor for significantly intense reflections |
0.0495 |
Weighted residual factors for significantly intense reflections |
0.1073 |
Weighted residual factors for all reflections included in the refinement |
0.1163 |
Goodness-of-fit parameter for all reflections included in the refinement |
1.084 |
Diffraction radiation wavelength |
0.71073 Å |
Diffraction radiation type |
MoKα |
Has coordinates |
Yes |
Has disorder |
No |
Has Fobs |
No |
For the version history of this entry, please navigate to main COD server.
The link is:
https://www.crystallography.net/4134529.html