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Information card for entry 4300025
Preview
Coordinates | 4300025.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C99.37 H10.74 Bi8 Cl6.74 F80 O22 |
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Calculated formula | C99.38 H10.76 Bi8 Cl6.76 F80 O22 |
Title of publication | Oligomerization and Oxide Formation in Bismuth Aryl Alkoxides: Synthesis and Characterization of Bi4(μ4-O)(μ-OC6F5)6{μ3-OBi(μ-OC6F5)3}2(C6H5CH3), Bi8(μ4-O)2(μ3-O)2(μ-OC6F5)16, Bi6(μ3-O)4(μ3-OC6F5){μ3-OBi(OC6F5)4}3, NaBi4(μ3-O)2(OC6F5)9(THF)2, and Na2Bi4(μ3-O)2(OC6F5)10(THF)2 |
Authors of publication | Kenton H. Whitmire; Silke Hoppe; Orson Sydora; Jennifer L. Jolas; Carolyn M. Jones |
Journal of publication | Inorganic Chemistry |
Year of publication | 2000 |
Journal volume | 39 |
Pages of publication | 85 - 97 |
a | 14.292 ± 0.003 Å |
b | 15.111 ± 0.003 Å |
c | 17.545 ± 0.004 Å |
α | 112.19 ± 0.03° |
β | 104.46 ± 0.03° |
γ | 100.58 ± 0.03° |
Cell volume | 3230 ± 1.8 Å3 |
Cell temperature | 193 ± 2 K |
Ambient diffraction temperature | 123 ± 2 K |
Number of distinct elements | 6 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.056 |
Residual factor for significantly intense reflections | 0.0397 |
Weighted residual factors for all reflections | 0.1015 |
Weighted residual factors for significantly intense reflections | 0.0931 |
Goodness-of-fit parameter for all reflections | 1.048 |
Goodness-of-fit parameter for significantly intense reflections | 1.089 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | Yes |
Has Fobs | No |
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