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Information card for entry 4308085
Preview
Coordinates | 4308085.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C42 H52 Cl2 Cu3 N8 O6 |
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Calculated formula | C42 H52 Cl2 Cu3 N8 O6 |
SMILES | c12ccccc1C[NH]1[Cu]34([O]2[Cu]2([O]5[Cu]67(Cl)[NH](Cc8c5cccc8)CC(C[NH]6Cc5c(cccc5)[O]27)O)[O]4c2ccccc2C[NH]3CC(C1)O)Cl.C(#N)C.C(#N)C.C(#N)C.C(#N)C |
Title of publication | Controlled Copper-Mediated Chlorination of Phenol Rings under Mild Conditions |
Authors of publication | Yu-Fei Song; Gerard A. van Albada; Jinkui Tang; Ilpo Mutikainen; Urho Turpeinen; Chiara Massera; Olivier Roubeau; José Sanchez Costa; Patrick Gamez; Jan Reedijk |
Journal of publication | Inorganic Chemistry |
Year of publication | 2007 |
Journal volume | 46 |
Pages of publication | 4944 - 4950 |
a | 11.992 ± 0.002 Å |
b | 17.992 ± 0.003 Å |
c | 11.908 ± 0.002 Å |
α | 90° |
β | 114.19 ± 0.03° |
γ | 90° |
Cell volume | 2343.7 ± 0.9 Å3 |
Cell temperature | 173 ± 2 K |
Ambient diffraction temperature | 173 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0696 |
Residual factor for significantly intense reflections | 0.0384 |
Weighted residual factors for significantly intense reflections | 0.0817 |
Weighted residual factors for all reflections included in the refinement | 0.0906 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.041 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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