Information card for entry 4308865

Structure parameters

• Formula: C36 H52 Cl2 N2 O2 Os
• Calculated formula: C36 H52 Cl2 N2 O2 Os
• SMILES: [Os]123(Cl)(Cl)Oc4c(C=[N]2[C@@H]2[C@@H]([N]3=Cc3cc(cc(c3O1)C(C)(C)C)C(C)(C)C)CCCC2)cc(cc4C(C)(C)C)C(C)(C)C.[Os]123(Cl)(Cl)Oc4c(C=[N]2[C@H]2[C@H]([N]3=Cc3cc(cc(c3O1)C(C)(C)C)C(C)(C)C)CCCC2)cc(cc4C(C)(C)C)C(C)(C)C
• Title of publication: Chiral Osmium Complexes with Sterically Bulky Schiff-Base Ligands. Crystal Structures of Os(IV) Derivatives and the Reactivity and Catalytic Cyclopropanation of Alkenes with EDA
• Authors of publication: Jing Zhang; Jiang-Lin Liang; Xian-Ru Sun; Hai-Bing Zhou; Nian-Yong Zhu; Zhong-Yuan Zhou; Philip Wai Hong Chan; Chi-Ming Che
• Journal of publication: Inorganic Chemistry
• Year of publication: 2005
• Journal volume: 44
• Pages of publication: 3942 - 3954
• a: 12.1571 ± 0.0011 Å
• b: 13.3553 ± 0.0012 Å
• c: 13.3721 ± 0.0012 Å
• α: 69.723 ± 0.002°
• β: 81.066 ± 0.002°
• γ: 71.178 ± 0.002°
• Cell volume: 1925.4 ± 0.3 ų
• Cell temperature: 294 ± 2 K
• Ambient diffraction temperature: 294 ± 2 K
• Number of distinct elements: 6
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.054
• Residual factor for significantly intense reflections: 0.0445
• Weighted residual factors for significantly intense reflections: 0.1095
• Weighted residual factors for all reflections included in the refinement: 0.1183
• Goodness-of-fit parameter for all reflections included in the refinement: 0.812
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No