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Information card for entry 4313921
Preview
Coordinates | 4313921.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C76 H140 N4 O16 Si8 Ti4 |
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Calculated formula | C76 H140 N4 O16 Si8 Ti4 |
SMILES | C[Si](C)(C)N(c1c(cccc1C(C)C)C(C)C)[Si]12O[Ti]3(O[Si]4(N(c5c(cccc5C(C)C)C(C)C)[Si](C)(C)C)O[Ti]5(O[Si](O3)(N(c3c(cccc3C(C)C)C(C)C)[Si](C)(C)C)O[Ti](O[Si](N(c3c(cccc3C(C)C)C(C)C)[Si](C)(C)C)(O[Ti](O1)(O4)OC(C)(C)C)O5)(O2)OC(C)(C)C)OC(C)(C)C)OC(C)(C)C |
Title of publication | Reactivity Studies, Structural Characterization, and Thermolysis of Cubic Titanosiloxanes: Precursors to Titanosilicate Materials Which Catalyze Olefin Epoxidation |
Authors of publication | Ramaswamy Murugavel; Paul Davis; Vivekanand S. Shete |
Journal of publication | Inorganic Chemistry |
Year of publication | 2003 |
Journal volume | 42 |
Pages of publication | 4696 - 4706 |
a | 31.606 Å |
b | 31.606 Å |
c | 31.606 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 31572.5 Å3 |
Cell temperature | 293 ± 2 K |
Ambient diffraction temperature | 293 ± 2 K |
Number of distinct elements | 6 |
Space group number | 220 |
Hermann-Mauguin space group symbol | I -4 3 d |
Hall space group symbol | I -4bd 2c 3 |
Residual factor for all reflections | 0.1525 |
Residual factor for significantly intense reflections | 0.0879 |
Weighted residual factors for significantly intense reflections | 0.1754 |
Weighted residual factors for all reflections included in the refinement | 0.2309 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.083 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4313921.html
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