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Information card for entry 4316286
Preview
Coordinates | 4316286.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C51 H40 Cl4 N4 O10 P2 Ru |
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Calculated formula | C51 H40 Cl4 N4 O10 P2 Ru |
SMILES | [Ru]1(Cl)([P](c2ccccc2)(c2ccccc2)c2ccccc2)([P](c2ccccc2)(c2ccccc2)c2ccccc2)(c2cc(N(=O)=O)ccc2c2[n]1c1cc(cc(N(=O)=O)c1o2)C)N=O.Cl(=O)(=O)(=O)[O-].ClCCl |
Title of publication | Oxidative Cyclization of a Phenolic Schiff Base and Synthesis of a Cyclometalated Ruthenium Nitrosyl Complex: Photoinduced NO Release by Visible Light |
Authors of publication | Kaushik Ghosh; Sushil Kumar; Rajan Kumar; Udai P. Singh; Nidhi Goel |
Journal of publication | Inorganic Chemistry |
Year of publication | 2010 |
Journal volume | 49 |
Pages of publication | 7235 - 7237 |
a | 11.6704 ± 0.0007 Å |
b | 21.2006 ± 0.0011 Å |
c | 19.7591 ± 0.0012 Å |
α | 90° |
β | 93.594 ± 0.003° |
γ | 90° |
Cell volume | 4879.2 ± 0.5 Å3 |
Cell temperature | 296 ± 2 K |
Ambient diffraction temperature | 296 ± 2 K |
Number of distinct elements | 7 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.0511 |
Residual factor for significantly intense reflections | 0.0365 |
Weighted residual factors for significantly intense reflections | 0.1198 |
Weighted residual factors for all reflections included in the refinement | 0.1451 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.127 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4316286.html
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