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Information card for entry 4317451
Preview
Coordinates | 4317451.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C84 H72 Fe N4 O2 Si2 |
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Calculated formula | C84 H72 Fe N4 O2 Si2 |
SMILES | [Fe]1(Oc2c(cccc2[Si](c2ccccc2)(c2ccccc2)c2ccccc2)c2c(O1)c([Si](c1ccccc1)(c1ccccc1)c1ccccc1)ccc2)(C#[N]c1c(cccc1C)C)(C#[N]c1c(cccc1C)C)(C#[N]c1c(cccc1C)C)C#[N]c1c(cccc1C)C |
Title of publication | 3,3'-Bis(triphenylsilyl)biphenoxide as a Sterically Hindered Ligand on Fe(II), Fe(III), and Cr(II) |
Authors of publication | Ajay Kayal; Sonny C. Lee |
Journal of publication | Inorganic Chemistry |
Year of publication | 2002 |
Journal volume | 41 |
Pages of publication | 321 - 330 |
a | 16.7731 ± 0.0006 Å |
b | 14.4705 ± 0.0003 Å |
c | 33.6776 ± 0.0012 Å |
α | 90° |
β | 99.991 ± 0.001° |
γ | 90° |
Cell volume | 8050.1 ± 0.4 Å3 |
Cell temperature | 200 ± 2 K |
Ambient diffraction temperature | 200 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0743 |
Residual factor for significantly intense reflections | 0.0523 |
Weighted residual factors for all reflections | 0.1309 |
Weighted residual factors for significantly intense reflections | 0.1236 |
Goodness-of-fit parameter for all reflections | 1.059 |
Goodness-of-fit parameter for significantly intense reflections | 1.174 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4317451.html
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