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Information card for entry 4321233
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Coordinates | 4321233.cif |
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Original paper (by DOI) | HTML |
Common name | Compound 16 |
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Formula | C19 H34 N O2 S2 Si V |
Calculated formula | C19 H34 N O2 S2 Si V |
SMILES | [V]12(SCC[O]2CCS1)(Oc1c(cccc1C(C)C)C(C)C)=N[Si](C)(C)C |
Title of publication | Vanadium Complexes of the N(CH2CH2S)33- and O(CH2CH2S)22- Ligands with Coligands Relevant to Nitrogen Fixation Processes |
Authors of publication | Sian C. Davies; David L. Hughes; Zofia Janas; Lucjan B. Jerzykiewicz; Raymond L. Richards; J. Roger Sanders; James E. Silverston; Piotr Sobota |
Journal of publication | Inorganic Chemistry |
Year of publication | 2000 |
Journal volume | 39 |
Pages of publication | 3485 - 3498 |
a | 9.646 ± 0.002 Å |
b | 10.103 ± 0.002 Å |
c | 15.001 ± 0.003 Å |
α | 91.06 ± 0.03° |
β | 102.12 ± 0.03° |
γ | 118.16 ± 0.03° |
Cell volume | 1248.4 ± 0.6 Å3 |
Cell temperature | 302 ± 2 K |
Ambient diffraction temperature | 302 ± 2 K |
Number of distinct elements | 7 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0601 |
Residual factor for significantly intense reflections | 0.0516 |
Weighted residual factors for all reflections | 0.1719 |
Weighted residual factors for significantly intense reflections | 0.1653 |
Goodness-of-fit parameter for all reflections | 1.12 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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