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Information card for entry 4322134
Preview
| Coordinates | 4322134.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C56 H50 Cu F6 N4 O P |
|---|---|
| Calculated formula | C56 H50 Cu F6 N4 O P |
| Title of publication | Effects of Sterics and Electronic Delocalization on the Photophysical, Structural, and Electrochemical Properties of 2,9-Disubstituted 1,10-Phenanthroline Copper(I) Complexes |
| Authors of publication | Mark T. Miller; Peter K. Gantzel; Timothy B. Karpishin |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 1999 |
| Journal volume | 38 |
| Pages of publication | 3414 - 3422 |
| a | 11.854 ± 0.003 Å |
| b | 14.705 ± 0.003 Å |
| c | 15.866 ± 0.004 Å |
| α | 107.81° |
| β | 106.72° |
| γ | 97.56° |
| Cell volume | 2447.6 ± 1 Å3 |
| Cell temperature | 187 ± 2 K |
| Ambient diffraction temperature | 187 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.1149 |
| Residual factor for significantly intense reflections | 0.0752 |
| Weighted residual factors for all reflections | 0.2348 |
| Weighted residual factors for significantly intense reflections | 0.1909 |
| Goodness-of-fit parameter for all reflections | 1.016 |
| Goodness-of-fit parameter for significantly intense reflections | 1.013 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4322134.html
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