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Information card for entry 4322136
Preview
Coordinates | 4322136.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C56 H32 Cu F6 N4 P |
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Calculated formula | C56 H32 Cu F6 N4 P |
SMILES | [Cu]12([n]3c(ccc4c3c3[n]1c(ccc3cc4)C#Cc1ccccc1)C#Cc1ccccc1)[n]1c(ccc3c1c1[n]2c(ccc1cc3)C#Cc1ccccc1)C#Cc1ccccc1.[P](F)(F)(F)(F)(F)[F-] |
Title of publication | Effects of Sterics and Electronic Delocalization on the Photophysical, Structural, and Electrochemical Properties of 2,9-Disubstituted 1,10-Phenanthroline Copper(I) Complexes |
Authors of publication | Mark T. Miller; Peter K. Gantzel; Timothy B. Karpishin |
Journal of publication | Inorganic Chemistry |
Year of publication | 1999 |
Journal volume | 38 |
Pages of publication | 3414 - 3422 |
a | 13.327 ± 0.007 Å |
b | 14.114 ± 0.007 Å |
c | 15.175 ± 0.005 Å |
α | 87.23 ± 0.04° |
β | 66.48 ± 0.03° |
γ | 61.84 ± 0.04° |
Cell volume | 2273 ± 2 Å3 |
Cell temperature | 295 ± 2 K |
Ambient diffraction temperature | 295 ± 2 K |
Number of distinct elements | 6 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0678 |
Residual factor for significantly intense reflections | 0.0547 |
Weighted residual factors for all reflections | 0.1599 |
Weighted residual factors for significantly intense reflections | 0.1445 |
Goodness-of-fit parameter for all reflections | 1.021 |
Goodness-of-fit parameter for significantly intense reflections | 1.041 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4322136.html
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