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Information card for entry 4322450
Preview
Coordinates | 4322450.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C24 H28 Cl8 Nb2 P4 |
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Calculated formula | C24 H28 Cl8 Nb2 P4 |
SMILES | c1ccccc1[PH2][Nb]1234([PH2]c5ccccc5)(Cl)(Cl)[Nb]([PH2]c5ccccc5)([PH2]c5ccccc5)(Cl)(Cl)([Cl]1)([Cl]2)([Cl]3)[Cl]4 |
Title of publication | Synthesis, Structure, and Chemical Vapor Deposition Studies of Molecular Precursors to NbP Films |
Authors of publication | Joseph T. Scheper; Kumudini C. Jayaratne; Louise M. Liable-Sands; Glenn P. A. Yap; Arnold L. Rheingold; Charles H. Winter |
Journal of publication | Inorganic Chemistry |
Year of publication | 1999 |
Journal volume | 38 |
Pages of publication | 4354 - 4360 |
a | 8.873 ± 0.002 Å |
b | 17.394 ± 0.006 Å |
c | 21.778 ± 0.003 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 3361.2 ± 1.5 Å3 |
Cell temperature | 298 ± 2 K |
Ambient diffraction temperature | 298 ± 2 K |
Number of distinct elements | 5 |
Space group number | 61 |
Hermann-Mauguin space group symbol | P b c a |
Hall space group symbol | -P 2ac 2ab |
Residual factor for all reflections | 0.0441 |
Residual factor for significantly intense reflections | 0.0284 |
Weighted residual factors for all reflections | 0.0621 |
Weighted residual factors for significantly intense reflections | 0.0602 |
Goodness-of-fit parameter for all reflections | 0.835 |
Goodness-of-fit parameter for significantly intense reflections | 0.989 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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