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Information card for entry 4324367
Preview
| Coordinates | 4324367.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | NiHCl(IMes)2 |
|---|---|
| Formula | C42 H49 Cl N4 Ni |
| Calculated formula | C42 H49 Cl N4 Ni |
| SMILES | [NiH](Cl)(=C1N(C=CN1c1c(cc(cc1C)C)C)c1c(cc(cc1C)C)C)=C1N(C=CN1c1c(cc(cc1C)C)C)c1c(cc(cc1C)C)C |
| Title of publication | HX Addition and Photochemical H2 Elimination by Ni NHC Complexes |
| Authors of publication | Chang Hoon Lee; Timothy R. Cook; Daniel G. Nocera |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 2011 |
| Journal volume | 50 |
| Pages of publication | 714 - 716 |
| a | 17.067 ± 0.003 Å |
| b | 18.815 ± 0.003 Å |
| c | 23.195 ± 0.004 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 7448 ± 2 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 61 |
| Hermann-Mauguin space group symbol | P b c a |
| Hall space group symbol | -P 2ac 2ab |
| Residual factor for all reflections | 0.0999 |
| Residual factor for significantly intense reflections | 0.0581 |
| Weighted residual factors for significantly intense reflections | 0.1405 |
| Weighted residual factors for all reflections included in the refinement | 0.1664 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.023 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4324367.html
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