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Information card for entry 4326469
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Jmol._Canvas2D (Jmol) "jmolApplet0"[x]
Coordinates | 4326469.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C80 H100 N4 O6 Re2 |
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Calculated formula | C80 H100 N4 O6 Re2 |
SMILES | c1(N2c3c(O[Re]452(N(c2ccccc2)c2c(O4)c(cc(c2)C(C)(C)C)C(C)(C)C)O[Re]24(N(c6ccccc6)c6cc(cc(c6O2)C(C)(C)C)C(C)(C)C)(N(c2ccccc2)c2c(O4)c(cc(c2)C(C)(C)C)C(C)(C)C)O5)c(C(C)(C)C)cc(c3)C(C)(C)C)ccccc1 |
Title of publication | Harnessing Redox-Active Ligands for Low-Barrier Radical Addition at Oxorhenium Complexes |
Authors of publication | Cameron A. Lippert; Kenneth I. Hardcastle; Jake D. Soper |
Journal of publication | Inorganic Chemistry |
Year of publication | 2011 |
Journal volume | 50 |
Pages of publication | 9864 - 9878 |
a | 25.507 ± 0.008 Å |
b | 14.111 ± 0.004 Å |
c | 10.667 ± 0.003 Å |
α | 90° |
β | 102.387 ± 0.004° |
γ | 90° |
Cell volume | 3750 ± 1.9 Å3 |
Cell temperature | 173 ± 2 K |
Ambient diffraction temperature | 173 ± 2 K |
Number of distinct elements | 5 |
Space group number | 5 |
Hermann-Mauguin space group symbol | C 1 2 1 |
Hall space group symbol | C 2y |
Residual factor for all reflections | 0.0551 |
Residual factor for significantly intense reflections | 0.0433 |
Weighted residual factors for significantly intense reflections | 0.1138 |
Weighted residual factors for all reflections included in the refinement | 0.1244 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.132 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4326469.html
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Users of the data should acknowledge the original authors of the
structural data.