Information card for entry 4327005

Structure parameters

• Formula: C20 H54 Hf2 N6 Si2
• Calculated formula: C20 H54 Hf2 N6 Si2
• SMILES: CN(C)[Hf]1(N(C)C)N([Si](C(C)(C)C)(C)C)[Hf](N(C)C)(N(C)C)N1[Si](C(C)(C)C)(C)C
• Title of publication: Synthesis, Characterization, and Materials Chemistry of Group 4 Silylimides
• Authors of publication: Samuel D. Cosham; Andrew L. Johnson; Kieran C. Molloy; Andrew J. Kingsley
• Journal of publication: Inorganic Chemistry
• Year of publication: 2011
• Journal volume: 50
• Pages of publication: 12053 - 12063
• a: 9.983 ± 0.0002 Å
• b: 13.551 ± 0.0002 Å
• c: 11.686 ± 0.0002 Å
• α: 90°
• β: 90.899 ± 0.001°
• γ: 90°
• Cell volume: 1580.68 ± 0.05 ų
• Cell temperature: 150 ± 2 K
• Ambient diffraction temperature: 150 ± 2 K
• Number of distinct elements: 5
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0208
• Residual factor for significantly intense reflections: 0.0181
• Weighted residual factors for significantly intense reflections: 0.0444
• Weighted residual factors for all reflections included in the refinement: 0.0457
• Goodness-of-fit parameter for all reflections included in the refinement: 1.133
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No