Information card for entry 4333210

Structure parameters

• Formula: C10 H30 Cl3 N4 Si2 Ta
• Calculated formula: C10 H30 Cl3 N4 Si2 Ta
• SMILES: C[Si](C)(C)N1[N](C)(C)[Ta]21(N([N]2(C)C)[Si](C)(C)C)(Cl)(Cl)Cl
• Title of publication: Volatile Imido−Hydrazido Compounds of the Refractory Metals Niobium, Tantalum, Molybdenum, and Tungsten
• Authors of publication: Gaess, Daniel; Harms, Klaus; Pokoj, Michael; Stolz, Wolfgang; Sundermeyer, Jörg
• Journal of publication: Inorganic Chemistry
• Year of publication: 2007
• Journal volume: 46
• Journal issue: 16
• Pages of publication: 6688 - 6701
• a: 20.6186 ± 0.0011 Å
• b: 10.3248 ± 0.0005 Å
• c: 20.6359 ± 0.0013 Å
• α: 90°
• β: 106.432 ± 0.004°
• γ: 90°
• Cell volume: 4213.6 ± 0.4 ų
• Cell temperature: 193 ± 2 K
• Ambient diffraction temperature: 193 ± 2 K
• Number of distinct elements: 6
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0385
• Residual factor for significantly intense reflections: 0.0286
• Weighted residual factors for significantly intense reflections: 0.0571
• Weighted residual factors for all reflections included in the refinement: 0.0595
• Goodness-of-fit parameter for all reflections included in the refinement: 0.986
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No