Information card for entry 4339766

Structure parameters

• Common name: Hafnium
• Chemical name: Hafnium tris(amid) Trimethylsilyl silide
• Formula: C15 H45 Hf N3 Si4
• Calculated formula: C15 H45 Hf N3 Si4
• SMILES: C[Si](C)(C)[Si]([Hf](N(C)C)(N(C)C)N(C)C)([Si](C)(C)C)[Si](C)(C)C
• Title of publication: Amide-silyl ligand exchanges and equilibria among group 4 amide and silyl complexes.
• Authors of publication: Cai, Hu; Yu, Xianghua; Chen, Shujian; Qiu, He; Guzei, Ilia A.; Xue, Zi-Ling
• Journal of publication: Inorganic chemistry
• Year of publication: 2007
• Journal volume: 46
• Journal issue: 19
• Pages of publication: 8071 - 8078
• a: 15.483 ± 0.005 Å
• b: 15.483 ± 0.005 Å
• c: 19.378 ± 0.008 Å
• α: 90°
• β: 90°
• γ: 120°
• Cell volume: 4023 ± 2 ų
• Cell temperature: 293 ± 2 K
• Ambient diffraction temperature: 173 ± 2 K
• Number of distinct elements: 5
• Space group number: 161
• Hermann-Mauguin space group symbol: R 3 c :H
• Hall space group symbol: R 3 -2"c
• Residual factor for all reflections: 0.0567
• Residual factor for significantly intense reflections: 0.049
• Weighted residual factors for significantly intense reflections: 0.135
• Weighted residual factors for all reflections included in the refinement: 0.1655
• Goodness-of-fit parameter for all reflections included in the refinement: 1.178
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No