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Information card for entry 4344762
Preview
Coordinates | 4344762.cif |
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Original paper (by DOI) | HTML |
Formula | C38 H56 N3 O P Si2 |
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Calculated formula | C38 H56 N3 O P Si2 |
SMILES | P([Si](O[Si](C)(C)C)(=Nc1c(cccc1C(C)C)C(C)C)=C1N(C(=C(N1C(C)C)C)C)C(C)C)(c1ccccc1)c1ccccc1 |
Title of publication | Controlled Oxidation of an NHC-Stabilized Phosphinoaminosilylene with Dioxygen. |
Authors of publication | Cui, Haiyan; Zhang, Jianying; Tao, Yunwen; Cui, Chunming |
Journal of publication | Inorganic chemistry |
Year of publication | 2015 |
Journal volume | 55 |
Journal issue | 1 |
Pages of publication | 46 |
a | 18.7 ± 0.004 Å |
b | 11.581 ± 0.003 Å |
c | 17.899 ± 0.004 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 3876.3 ± 1.6 Å3 |
Cell temperature | 113 ± 2 K |
Ambient diffraction temperature | 113 ± 2 K |
Number of distinct elements | 6 |
Space group number | 29 |
Hermann-Mauguin space group symbol | P c a 21 |
Hall space group symbol | P 2c -2ac |
Residual factor for all reflections | 0.0369 |
Residual factor for significantly intense reflections | 0.0341 |
Weighted residual factors for significantly intense reflections | 0.0797 |
Weighted residual factors for all reflections included in the refinement | 0.0808 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.064 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4344762.html
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