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Information card for entry 4344975
Preview
Coordinates | 4344975.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C24 H16 Bi I6 S16 |
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Calculated formula | C24 H16 Bi I6 S16 |
SMILES | C1=CSC(S1)=C1SC=CS1.C1(SC=CS1)=C1SC=CS1.[Bi]([I-])(I)([I-])([I-])(I)I.S1C=CSC1=C1SC=CS1.C1=CSC(S1)=C1SC=CS1 |
Title of publication | Mono- and Mixed-Valence Tetrathiafulvalene Semiconductors (TTF)BiI4 and (TTF)4BiI6 with 1D and 0D Bismuth-Iodide Networks. |
Authors of publication | Evans, Hayden A.; Labram, John G.; Smock, Sara R.; Wu, Guang; Chabinyc, Michael L.; Seshadri, Ram; Wudl, Fred |
Journal of publication | Inorganic chemistry |
Year of publication | 2017 |
Journal volume | 56 |
Journal issue | 1 |
Pages of publication | 395 - 401 |
a | 10.237 ± 0.008 Å |
b | 10.46 ± 0.005 Å |
c | 11.166 ± 0.008 Å |
α | 84.283 ± 0.015° |
β | 80.45 ± 0.02° |
γ | 85.85 ± 0.03° |
Cell volume | 1171.3 ± 1.4 Å3 |
Cell temperature | 296 ± 2 K |
Ambient diffraction temperature | 296 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.1048 |
Residual factor for significantly intense reflections | 0.0591 |
Weighted residual factors for significantly intense reflections | 0.1347 |
Weighted residual factors for all reflections included in the refinement | 0.1547 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.019 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4344975.html
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