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Information card for entry 4345286
Preview
Coordinates | 4345286.cif |
---|---|
Original paper (by DOI) | HTML |
Chemical name | T2@MV-2 |
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Formula | C24 H37 Ge4 N4 O5 S10 |
Calculated formula | C24 H37 Ge4 N4 O5 S10 |
SMILES | [Ge]12(S[Ge]3(S[Ge](S1)(S[Ge](S3)(S2)[S-])[S-])[S-])[S-].c1[n+](C)ccc(c2cc[n+](cc2)C)c1.[n+]1(C)ccc(c2cc[n+](cc2)C)cc1.O.O.O.O.O |
Title of publication | Substituent-Modulated Assembly Formation: An Approach to Enhancing the Photostability of Photoelectric-Sensitive Chalcogenide-Based Ion-Pair Hybrids. |
Authors of publication | Lin, Jian; Fu, Zhixing; Zhang, Jiaxu; Zhu, Yujia; Hu, Dandan; Li, Dongsheng; Wu, Tao |
Journal of publication | Inorganic chemistry |
Year of publication | 2017 |
Journal volume | 56 |
Journal issue | 6 |
Pages of publication | 3119 - 3122 |
a | 9.3893 ± 0.0002 Å |
b | 21.0435 ± 0.0004 Å |
c | 20.2874 ± 0.0005 Å |
α | 90° |
β | 90.333 ± 0.002° |
γ | 90° |
Cell volume | 4008.39 ± 0.15 Å3 |
Cell temperature | 223 ± 0.1 K |
Ambient diffraction temperature | 223 ± 0.1 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0441 |
Residual factor for significantly intense reflections | 0.0285 |
Weighted residual factors for significantly intense reflections | 0.0542 |
Weighted residual factors for all reflections included in the refinement | 0.0579 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.989 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4345286.html
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Users of the data should acknowledge the original authors of the
structural data.