Information card for entry 4346983

Structure parameters

• Formula: C42 H48 N Ni P2 Si2
• Calculated formula: C42 H48 N Ni P2 Si2
• SMILES: [Ni]([P](c1ccccc1)(c1ccccc1)c1ccccc1)([P](c1ccccc1)(c1ccccc1)c1ccccc1)N([Si](C)(C)C)[Si](C)(C)C
• Title of publication: Field-Induced Slow Magnetic Relaxation in the Ni(I) Complexes [NiCl(PPh3)2]·C4H8O and [Ni(N(SiMe3)2)(PPh3)2].
• Authors of publication: Lin, Weiquan; Bodenstein, Tilmann; Mereacre, Valeriu; Fink, Karin; Eichhöfer, Andreas
• Journal of publication: Inorganic chemistry
• Year of publication: 2016
• Journal volume: 55
• Journal issue: 5
• Pages of publication: 2091 - 2100
• a: 9.2652 ± 0.0004 Å
• b: 12.1614 ± 0.0006 Å
• c: 18.5275 ± 0.0008 Å
• α: 98.082 ± 0.004°
• β: 91.505 ± 0.003°
• γ: 106.332 ± 0.004°
• Cell volume: 1978.74 ± 0.16 ų
• Cell temperature: 180 ± 2 K
• Ambient diffraction temperature: 180 ± 2 K
• Number of distinct elements: 6
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.0345
• Residual factor for significantly intense reflections: 0.0257
• Weighted residual factors for significantly intense reflections: 0.0653
• Weighted residual factors for all reflections included in the refinement: 0.0678
• Goodness-of-fit parameter for all reflections included in the refinement: 1.02
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No