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Information card for entry 4501506
Preview
| Coordinates | 4501506.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C20 H19 Cu N6 S |
|---|---|
| Calculated formula | C20 H19 Cu N6 S |
| Title of publication | Formation of [CuSCN]n-Based Topological Structures via a Family of Flexible Benzimidazolyl-Based Linkers with Different Spacer Lengths |
| Authors of publication | Li, Ling-Ling; Yuan, Rong-Xin; Liu, Lei-Lei; Ren, Zhi-Gang; Zheng, Ai-Xia; Cheng, Hong-Jian; Li, Hong-Xi; Lang, Jian-Ping |
| Journal of publication | Crystal Growth & Design |
| Year of publication | 2010 |
| Journal volume | 10 |
| Journal issue | 4 |
| Pages of publication | 1929 |
| a | 9.7226 ± 0.0019 Å |
| b | 9.75 ± 0.002 Å |
| c | 12.448 ± 0.003 Å |
| α | 100.75 ± 0.03° |
| β | 98.54 ± 0.03° |
| γ | 119.04 ± 0.03° |
| Cell volume | 973.5 ± 0.6 Å3 |
| Cell temperature | 223 ± 2 K |
| Ambient diffraction temperature | 223 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.08 |
| Residual factor for significantly intense reflections | 0.0501 |
| Weighted residual factors for significantly intense reflections | 0.1063 |
| Weighted residual factors for all reflections included in the refinement | 0.1193 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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