Information card for entry 4502129
| Formula |
C34 H44 N8 Ni2 O10 |
| Calculated formula |
C34 H44 N8 Ni2 O10 |
| SMILES |
CC1=CC(C)=[N]2CC[N]3[Ni]2([n]2ccc(cc2)c2cc[n](cc2)[Ni]245([N](=C(C=C(C)O4)C)CC[N]2=C(C)C=C(O5)C)ON(=O)=O)(O1)(OC(=CC=3C)C)ON(=O)=O |
| Title of publication |
Auxiliary Ligand-Dependent Assembly of Several Ni/Ni−Cd Compounds with N2O2Donor Tetradentate Symmetrical Schiff Base Ligand |
| Authors of publication |
Ge, Ying-Ying; Li, Guo-Bi; Fang, Hua-Cai; Zhan, Xu-Lin; Gu, Zhi-Gang; Chen, Jin-Hao; Sun, Feng; Cai, Yue-Peng; Thallapally, Praveen K. |
| Journal of publication |
Crystal Growth & Design |
| Year of publication |
2010 |
| Journal volume |
10 |
| Journal issue |
11 |
| Pages of publication |
4987 |
| a |
7.5202 ± 0.0009 Å |
| b |
8.3259 ± 0.0011 Å |
| c |
15.867 ± 0.002 Å |
| α |
78.408 ± 0.007° |
| β |
82.447 ± 0.01° |
| γ |
70.757 ± 0.006° |
| Cell volume |
916.5 ± 0.2 Å3 |
| Cell temperature |
298 ± 2 K |
| Ambient diffraction temperature |
298 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0704 |
| Residual factor for significantly intense reflections |
0.0589 |
| Weighted residual factors for significantly intense reflections |
0.1646 |
| Weighted residual factors for all reflections included in the refinement |
0.1745 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.076 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4502129.html