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Information card for entry 4506259
Preview
Coordinates | 4506259.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C24 H60 Cl4 Cu2 N6 Ni3 O6 |
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Calculated formula | C24 H60 Cl4 Cu2 N6 Ni3 O6 |
SMILES | C1C[N](C)(C)[Cu]234([O]51[Ni]167([O]82CC[N](C)(C)[Ni]2458([N](CC[O]12)(C)C)[Cl]3)[O]12CC[N](C)(C)[Cu]341([O]16CC[N](C)(C)[Ni]5241([N](CC[O]75)(C)C)[Cl]3)Cl)Cl |
Title of publication | Discussion of Planarity of Molecular Structures Using Novel Pentanuclear Cu/Ni Complexes as an Example |
Authors of publication | Buvaylo, Elena A.; Nesterova, Oksana V.; Kokozay, Vladimir N.; Vassilyeva, Olga Yu.; Skelton, Brian W.; Boča, Roman; Nesterov, Dmytro S. |
Journal of publication | Crystal Growth & Design |
Year of publication | 2012 |
Journal volume | 12 |
Journal issue | 6 |
Pages of publication | 3200 |
a | 10.8948 ± 0.0004 Å |
b | 16.0279 ± 0.0006 Å |
c | 21.7661 ± 0.0005 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 3800.8 ± 0.2 Å3 |
Cell temperature | 180 ± 2 K |
Ambient diffraction temperature | 180 ± 2 K |
Number of distinct elements | 7 |
Space group number | 61 |
Hermann-Mauguin space group symbol | P b c a |
Hall space group symbol | -P 2ac 2ab |
Residual factor for all reflections | 0.0743 |
Residual factor for significantly intense reflections | 0.0285 |
Weighted residual factors for significantly intense reflections | 0.0672 |
Weighted residual factors for all reflections included in the refinement | 0.0954 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.564 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4506259.html
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