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Information card for entry 4507642
Preview
Coordinates | 4507642.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C64 H104 N20 O10 Sn4 |
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Calculated formula | C64 H104 N20 O10 Sn4 |
SMILES | c1nc2c(ncn2CCC(=O)O[Sn]2(OC(=[O][Sn]3([O]2[Sn]2(OC(=[O][Sn](OC(=O)CCn4c5c(c(ncn5)N)nc4)([O]32)(CCCC)CCCC)CCn2c3c(c(ncn3)N)nc2)(CCCC)CCCC)(CCCC)CCCC)CCn2cnc3c2ncnc3N)(CCCC)CCCC)c(n1)N |
Title of publication | Supramolecular Signatures of Adenine-Containing Organostannoxane Assemblies |
Authors of publication | Chandrasekhar, Vadapalli; Kundu, Subrata; Kumar, Jitendra; Verma, Sandeep; Gopal, Kandasamy; Chaturbedi, Amaresh; Subramaniam, Kuppuswamy |
Journal of publication | Crystal Growth & Design |
Year of publication | 2013 |
Journal volume | 13 |
Journal issue | 4 |
Pages of publication | 1665 |
a | 11.648 ± 0.005 Å |
b | 12.78 ± 0.005 Å |
c | 14.126 ± 0.005 Å |
α | 73.159 ± 0.005° |
β | 69.017 ± 0.005° |
γ | 78.508 ± 0.005° |
Cell volume | 1868.4 ± 1.3 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0334 |
Residual factor for significantly intense reflections | 0.0288 |
Weighted residual factors for significantly intense reflections | 0.0766 |
Weighted residual factors for all reflections included in the refinement | 0.0801 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.061 |
Diffraction radiation wavelength | 0.71069 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4507642.html
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Users of the data should acknowledge the original authors of the
structural data.