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Information card for entry 4509725
Preview
Coordinates | 4509725.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C50 H76 Cl4 N12 O6 |
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Calculated formula | C50 H76 Cl4 N12 O6 |
SMILES | [C@H]12CCCC[C@H]1N1C(=O)N2CN2[C@H]3CCCC[C@H]3N(C2=O)CN2[C@@H]3CCCC[C@@H]3N(C2=O)CN2[C@@H]3[C@@H](CCCC3)N(C2=O)CN2[C@@H]3CCCC[C@@H]3N(C2=O)CN2[C@H]3CCCC[C@H]3N(C2=O)C1.C(Cl)Cl.C(Cl)Cl |
Title of publication | Solvent Effect on Pseudopolymorphism of Hemicyclohexylcucurbit[6]uril |
Authors of publication | Li, Yitao; Li, Lin; Zhu, Yanping; Meng, Xianggao; Wu, Anxin |
Journal of publication | Crystal Growth & Design |
Year of publication | 2009 |
Journal volume | 9 |
Journal issue | 10 |
Pages of publication | 4255 |
a | 12.1897 ± 0.0013 Å |
b | 12.5162 ± 0.0019 Å |
c | 12.5295 ± 0.0014 Å |
α | 115.859 ± 0.003° |
β | 92.622 ± 0.002° |
γ | 118.776 ± 0.002° |
Cell volume | 1426.3 ± 0.3 Å3 |
Cell temperature | 298 ± 2 K |
Ambient diffraction temperature | 298 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.1002 |
Residual factor for significantly intense reflections | 0.075 |
Weighted residual factors for significantly intense reflections | 0.2212 |
Weighted residual factors for all reflections included in the refinement | 0.2412 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.059 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4509725.html
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Users of the data should acknowledge the original authors of the
structural data.