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Information card for entry 4510295
Preview
Coordinates | 4510295.cif |
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Original paper (by DOI) | HTML |
Formula | C26 H30 S2 Si2 |
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Calculated formula | C26 H30 S2 Si2 |
SMILES | s1c(ccc1c1sc(cc1)c1ccc([Si](C)(C)C)cc1)c1ccc(cc1)[Si](C)(C)C |
Title of publication | Molecularly Smooth Single-Crystalline Films of Thiophene‒Phenylene Co-Oligomers Grown at the Gas‒Liquid Interface |
Authors of publication | Postnikov, Valery A.; Odarchenko, Yaroslav I.; Iovlev, Alexander V.; Bruevich, Vladimir V.; Pereverzev, Alexander Yu.; Kudryashova, Ludmila G.; Sobornov, Vladimir V.; Vidal, Loïc; Chernyshov, Dmitry; Luponosov, Yuriy N.; Borshchev, Oleg V.; Surin, Nikolay M.; Ponomarenko, Sergei A.; Ivanov, Dimitri A.; Paraschuk, Dmitry Yu. |
Journal of publication | Crystal Growth & Design |
Year of publication | 2014 |
Journal volume | 14 |
Journal issue | 4 |
Pages of publication | 1726 |
a | 12.246 ± 0.002 Å |
b | 12.25 ± 0.003 Å |
c | 34.687 ± 0.007 Å |
α | 90° |
β | 90.55 ± 0.03° |
γ | 90° |
Cell volume | 5203.3 ± 1.9 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 4 |
Space group number | 9 |
Hermann-Mauguin space group symbol | C 1 c 1 |
Hall space group symbol | C -2yc |
Residual factor for all reflections | 0.0749 |
Residual factor for significantly intense reflections | 0.0606 |
Weighted residual factors for significantly intense reflections | 0.1727 |
Weighted residual factors for all reflections included in the refinement | 0.1839 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.07 |
Diffraction radiation wavelength | 0.69411 Å |
Diffraction radiation type | synchrotron |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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