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Information card for entry 4510995
Preview
Coordinates | 4510995.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | 3,5-Dihydroxybenzoic acid dimethylsulfoxide solvate |
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Formula | C50 H66 O31 S4 |
Calculated formula | C50 H66 O31 S4 |
SMILES | Oc1cc(cc(O)c1)C(=O)O.Oc1cc(cc(O)c1)C(=O)O.Oc1cc(cc(O)c1)C(=O)O.Oc1cc(cc(O)c1)C(=O)O.Oc1cc(cc(O)c1)C(=O)O.Oc1cc(cc(O)c1)C(=O)O.S(=O)(C)C.S(=O)(C)C.S(=O)(C)C.S(=O)(C)C.O.O.O |
Title of publication | Using Water as a Design Element in Crystal Engineering. Host−Guest Compounds of Hydrated 3,5-Dihydroxybenzoic Acid |
Authors of publication | Varughese, Sunil; Desiraju, Gautam R. |
Journal of publication | Crystal Growth & Design |
Year of publication | 2010 |
Journal volume | 10 |
Journal issue | 9 |
Pages of publication | 4184 |
a | 12.266 ± 0.003 Å |
b | 13.541 ± 0.003 Å |
c | 19.657 ± 0.004 Å |
α | 73.79 ± 0.03° |
β | 78.43 ± 0.03° |
γ | 73.19 ± 0.03° |
Cell volume | 2975.5 ± 1.3 Å3 |
Cell temperature | 123 ± 2 K |
Ambient diffraction temperature | 123 ± 2 K |
Number of distinct elements | 4 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0652 |
Residual factor for significantly intense reflections | 0.057 |
Weighted residual factors for significantly intense reflections | 0.1679 |
Weighted residual factors for all reflections included in the refinement | 0.1818 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.068 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4510995.html
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