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Information card for entry 4511535
Preview
Coordinates | 4511535.cif |
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Original paper (by DOI) | HTML |
Formula | C25 H22 Cl2 N2 O Sn |
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Calculated formula | C25 H22 Cl2 N2 O Sn |
SMILES | [Sn]12(Cl)(Cl)(Oc3c([N]2=Cc2[n]1cccc2)cccc3)c1ccccc1.Cc1ccccc1 |
Title of publication | Subtle C‒H···Hal (Hal = Cl, Br) Bonding as Predominant Synthon in the Assembly of Supramolecular Architectures Based on Luminescent Tin(IV) Complexes. Crystallography, Hirshfeld Surfaces, DFT Calculations, and Fluorescence |
Authors of publication | Guzmán-Percástegui, Edmundo; Alvarado-Rodríguez, José G.; Cruz-Borbolla, Julián; Andrade-López, Noemí; Vázquez-García, Rosa A.; Nava-Galindo, Rigo N.; Pandiyan, Thangarasu |
Journal of publication | Crystal Growth & Design |
Year of publication | 2014 |
Journal volume | 14 |
Journal issue | 8 |
Pages of publication | 3742 |
a | 9.3066 ± 0.0004 Å |
b | 9.524 ± 0.0004 Å |
c | 14.0942 ± 0.0005 Å |
α | 104.361 ± 0.003° |
β | 94.016 ± 0.003° |
γ | 98.977 ± 0.003° |
Cell volume | 1187.65 ± 0.09 Å3 |
Cell temperature | 293 ± 2 K |
Ambient diffraction temperature | 293 ± 2 K |
Number of distinct elements | 6 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0232 |
Residual factor for significantly intense reflections | 0.0199 |
Weighted residual factors for significantly intense reflections | 0.0484 |
Weighted residual factors for all reflections included in the refinement | 0.0502 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.033 |
Diffraction radiation wavelength | 0.7107 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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