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Information card for entry 4512162
Preview
Coordinates | 4512162.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C45 H40 N4 O12 P4 |
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Calculated formula | C45 H40 N4 O12 P4 |
SMILES | c1(ccccn1)c1ncccc1.OP(=O)(O)c1ccc(C(c2ccc(cc2)P(=O)(O)O)(c2ccc(cc2)P(=O)(O)O)c2ccc(cc2)P(=O)(O)O)cc1.c1(c2ncccc2)ncccc1 |
Title of publication | Extending the Family of Tetrahedral Tectons: Phenyl Embraces in Supramolecular Polymers of Tetraphenylmethane-based Tetraphosphonic Acid Templated by Organic Bases |
Authors of publication | Zaręba, Jan K.; Białek, Michał J.; Janczak, Jan; Zoń, Jerzy; Dobosz, Agnieszka |
Journal of publication | Crystal Growth & Design |
Year of publication | 2014 |
Journal volume | 14 |
Journal issue | 11 |
Pages of publication | 6143 |
a | 16.8962 ± 0.0008 Å |
b | 16.8962 ± 0.0008 Å |
c | 7.2119 ± 0.0008 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 2058.9 ± 0.3 Å3 |
Cell temperature | 295 ± 2 K |
Ambient diffraction temperature | 295 ± 2 K |
Number of distinct elements | 5 |
Space group number | 82 |
Hermann-Mauguin space group symbol | I -4 |
Hall space group symbol | I -4 |
Residual factor for all reflections | 0.1296 |
Residual factor for significantly intense reflections | 0.0577 |
Weighted residual factors for significantly intense reflections | 0.0886 |
Weighted residual factors for all reflections included in the refinement | 0.1164 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.007 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4512162.html
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