Information card for entry 4512474
| Common name |
Na3Ba2B6O12F |
| Formula |
B6 Ba2 F Na3 O12 |
| Calculated formula |
B6 Ba2 F Na3 O12 |
| SMILES |
B1(OB(OB(O1)[O-])[O-])[O-].[Na+].[F-].[Ba+2].B1(OB(OB(O1)[O-])[O-])[O-].[Ba+2].[Na+].[Na+] |
| Title of publication |
Na3Ba2(B3O6)2F: Next Generation of Deep-Ultraviolet Birefringent Materials |
| Authors of publication |
Zhang, Hui; Zhang, Min; Pan, Shilie; Yang, Zhihua; Wang, Zheng; Bian, Qiang; Hou, Xueling; Yu, Hongwei; Zhang, Fangfang; Wu, Kui; Yang, Feng; Peng, Qinjun; Xu, Zuyan; Chang, Kelvin B.; Poeppelmeier, Kenneth R. |
| Journal of publication |
Crystal Growth & Design |
| Year of publication |
2015 |
| Journal volume |
15 |
| Journal issue |
1 |
| Pages of publication |
523 |
| a |
7.3489 ± 0.001 Å |
| b |
7.3489 ± 0.001 Å |
| c |
12.642 ± 0.004 Å |
| α |
90° |
| β |
90° |
| γ |
120° |
| Cell volume |
591.3 ± 0.2 Å3 |
| Cell temperature |
296 ± 2 K |
| Ambient diffraction temperature |
296 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
176 |
| Hermann-Mauguin space group symbol |
P 63/m |
| Hall space group symbol |
-P 6c |
| Residual factor for all reflections |
0.0128 |
| Residual factor for significantly intense reflections |
0.0124 |
| Weighted residual factors for significantly intense reflections |
0.0285 |
| Weighted residual factors for all reflections included in the refinement |
0.0286 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.226 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4512474.html