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Information card for entry 4513247
Preview
Coordinates | 4513247.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C36 H56 N10 O22 S4 |
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Calculated formula | C36 H56 N10 O22 S4 |
SMILES | S(=O)(=O)([O-])c1cc2c(O)c(c1)Cc1c(O)c(cc(c1)S(=O)(=O)[O-])Cc1cc(S(=O)(=O)[O-])cc(c1O)Cc1cc(S(=O)(=O)[O-])cc(c1O)C2.O.O.O.O.O.O.[NH3+]Cc1[nH+]cccc1.N(N)C(=[NH2+])N.N(N)C(=[NH2+])N |
Title of publication | Crystallization-Driven Multicomponent Encapsulation of Coulombically Repulsive Guests |
Authors of publication | Barboiu, Mihail; Dumitrescu, Dan; Petit, Eddy; Legrand, Yves-Marie; van der Lee, Arie |
Journal of publication | Crystal Growth & Design |
Year of publication | 2015 |
Journal volume | 15 |
Journal issue | 7 |
Pages of publication | 3525 |
a | 12.5102 ± 0.0005 Å |
b | 13.4656 ± 0.0005 Å |
c | 15.4021 ± 0.0006 Å |
α | 65.072 ± 0.004° |
β | 80.169 ± 0.003° |
γ | 83.094 ± 0.003° |
Cell volume | 2314.94 ± 0.17 Å3 |
Cell temperature | 175 K |
Ambient diffraction temperature | 175 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0642 |
Residual factor for significantly intense reflections | 0.0544 |
Weighted residual factors for all reflections | 0.0579 |
Weighted residual factors for significantly intense reflections | 0.0554 |
Weighted residual factors for all reflections included in the refinement | 0.0554 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.1075 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4513247.html
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Users of the data should acknowledge the original authors of the
structural data.