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Information card for entry 4513249
Preview
Coordinates | 4513249.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C36 H40 N10 Na O20 S4 |
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Calculated formula | C36 H40 N10 Na O20 S4 |
SMILES | [O-]S(=O)(=O)c1cc2c(O)c(Cc3c(O)c(Cc4c(c(Cc5c([O-])c(C2)cc(S(=O)(=O)[O-])c5)cc(S(=O)(=O)[O-])c4)O)cc(S(=O)(=O)[O-])c3)c1.[Na+].O.c1cc(C[NH3+])ncc1.[NH2+]=C(NN)N.[NH2+]=C(NN)N.O.O.O |
Title of publication | Crystallization-Driven Multicomponent Encapsulation of Coulombically Repulsive Guests |
Authors of publication | Barboiu, Mihail; Dumitrescu, Dan; Petit, Eddy; Legrand, Yves-Marie; van der Lee, Arie |
Journal of publication | Crystal Growth & Design |
Year of publication | 2015 |
Journal volume | 15 |
Journal issue | 7 |
Pages of publication | 3525 |
a | 11.73 ± 0.0005 Å |
b | 30.0399 ± 0.0011 Å |
c | 14.0781 ± 0.0007 Å |
α | 90° |
β | 95.903 ± 0.004° |
γ | 90° |
Cell volume | 4934.4 ± 0.4 Å3 |
Cell temperature | 175 K |
Ambient diffraction temperature | 175 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.1489 |
Residual factor for significantly intense reflections | 0.1304 |
Weighted residual factors for all reflections | 0.1455 |
Weighted residual factors for significantly intense reflections | 0.1347 |
Weighted residual factors for all reflections included in the refinement | 0.1347 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.05 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4513249.html
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Users of the data should acknowledge the original authors of the
structural data.