Information card for entry 4515383
| Formula |
C26 H14 N2 O4 |
| Calculated formula |
C26 H14 N2 O4 |
| SMILES |
c1ccccc1N1C(=O)c2ccc3c4c2c(ccc4C(=O)N(c2ccccc2)C3=O)C1=O |
| Title of publication |
Polymer-Assisted Single Crystal Engineering of Organic Semiconductors To Alter Electron Transport. |
| Authors of publication |
Xu, Haixiao; Zhou, Yecheng; Zhang, Jing; Jin, Jianqun; Liu, Guangfeng; Li, Yongxin; Ganguly, Rakesh; Huang, Li; Xu, Wei; Zhu, Daoben; Huang, Wei; Zhang, Qichun |
| Journal of publication |
ACS applied materials & interfaces |
| Year of publication |
2018 |
| Journal volume |
10 |
| Journal issue |
14 |
| Pages of publication |
11837 - 11842 |
| a |
8.5676 ± 0.0006 Å |
| b |
7.0454 ± 0.0004 Å |
| c |
30.713 ± 0.002 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
1853.9 ± 0.2 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
61 |
| Hermann-Mauguin space group symbol |
P b c a |
| Hall space group symbol |
-P 2ac 2ab |
| Residual factor for all reflections |
0.0914 |
| Residual factor for significantly intense reflections |
0.0638 |
| Weighted residual factors for significantly intense reflections |
0.1476 |
| Weighted residual factors for all reflections included in the refinement |
0.1655 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.058 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4515383.html