Information card for entry 4518715
| Formula |
C71 H64 O3 |
| Calculated formula |
C71 H64 O3 |
| SMILES |
c12c([C@H]3C=C[C@@H]1C3)c1ccc2c2ccc(c3ccc(c4ccc(c5ccc(c6ccc(c7ccc(c8ccc(c9ccc1cc9)cc8)cc7)cc6)cc5)cc4)cc3)cc2.O1CCCC1.O1CCCC1.O1CCCC1 |
| Title of publication |
Controlled Polymerization of Norbornene Cycloparaphenylenes Expands Carbon Nanomaterials Design Space |
| Authors of publication |
Maust, Ruth L.; Li, Penghao; Shao, Baihao; Zeitler, Sarah M.; Sun, Peiguan B.; Reid, Harrison W.; Zakharov, Lev N.; Golder, Matthew R.; Jasti, Ramesh |
| Journal of publication |
ACS Central Science |
| Year of publication |
2021 |
| a |
9.9507 ± 0.0004 Å |
| b |
17.1984 ± 0.0007 Å |
| c |
32.214 ± 0.0012 Å |
| α |
82.982 ± 0.002° |
| β |
85.75 ± 0.002° |
| γ |
89.947 ± 0.002° |
| Cell volume |
5456.4 ± 0.4 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.1454 |
| Residual factor for significantly intense reflections |
0.0978 |
| Weighted residual factors for significantly intense reflections |
0.2717 |
| Weighted residual factors for all reflections included in the refinement |
0.3101 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.058 |
| Diffraction radiation wavelength |
1.54178 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
For the version history of this entry, please navigate to main COD server.
The link is:
https://www.crystallography.net/4518715.html