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Information card for entry 7021421
Preview
Coordinates | 7021421.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C72 H60 Ge4 O8 Sn6 |
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Calculated formula | C72 H60 Ge4 O8 Sn6 |
SMILES | c1(ccccc1)[Ge]([O]12[Sn]34[O]5[Sn]61[O]1([Ge](c7ccccc7)(c7ccccc7)c7ccccc7)[Sn]75[O]4([Ge](c4ccccc4)(c4ccccc4)c4ccccc4)[Sn]45[O]3[Sn]32[O]4([Ge](c2ccccc2)(c2ccccc2)c2ccccc2)[Sn]1([O]75)[O]63)(c1ccccc1)c1ccccc1 |
Title of publication | Activation of E-Cl bonds (E = C, Si, Ge and Sn) by a C,N-chelated stannylene. |
Authors of publication | Padělková, Zdeňka; Svec, Petr; Pejchal, Vladimír; Růžička, Aleš |
Journal of publication | Dalton transactions (Cambridge, England : 2003) |
Year of publication | 2013 |
Journal volume | 42 |
Journal issue | 21 |
Pages of publication | 7660 - 7671 |
a | 16.001 ± 0.0007 Å |
b | 16.001 ± 0.0007 Å |
c | 17.4671 ± 0.0015 Å |
α | 90° |
β | 90° |
γ | 120° |
Cell volume | 3873 ± 0.4 Å3 |
Cell temperature | 150 ± 1 K |
Ambient diffraction temperature | 150 ± 1 K |
Number of distinct elements | 5 |
Space group number | 173 |
Hermann-Mauguin space group symbol | P 63 |
Hall space group symbol | P 6c |
Residual factor for all reflections | 0.0459 |
Residual factor for significantly intense reflections | 0.0342 |
Weighted residual factors for significantly intense reflections | 0.0673 |
Weighted residual factors for all reflections included in the refinement | 0.0723 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.056 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/7021421.html
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