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Information card for entry 7026195
Preview
Coordinates | 7026195.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C51 H86 Cl2 Ir2 N2 P2 Si |
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Calculated formula | C51 Cl2 Ir2 N2 P2 Si |
SMILES | [Ir]123([Ir]4([Cl]1)([P](c1c([N]4(C)C)ccc(c1)C)(C1CCCCC1)C1CCCCC1)[Si]2(Cl)c1c(cc(cc1C)C)C)[P](c1c([N]3(C)C)ccc(c1)C)(C1CCCCC1)C1CCCCC1 |
Title of publication | Synthesis of η(2)-cyclooctene iridium and rhodium complexes supported by a novel P,N-chelate ligand and their reactivity toward hydrosilanes: facile Cl migration from metal to silicon via silylene complex intermediates and formation of a base-stabilised silylene complex. |
Authors of publication | Hashimoto, Hisako; Suzuki, Toshinori; Tobita, Hiromi |
Journal of publication | Dalton transactions (Cambridge, England : 2003) |
Year of publication | 2010 |
Journal volume | 39 |
Journal issue | 39 |
Pages of publication | 9386 - 9400 |
a | 14.6736 ± 0.0009 Å |
b | 10.0455 ± 0.0007 Å |
c | 19.8282 ± 0.0014 Å |
α | 90° |
β | 108.567 ± 0.003° |
γ | 90° |
Cell volume | 2770.6 ± 0.3 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 7 |
Space group number | 4 |
Hermann-Mauguin space group symbol | P 1 21 1 |
Hall space group symbol | P 2yb |
Residual factor for all reflections | 0.1278 |
Residual factor for significantly intense reflections | 0.0896 |
Weighted residual factors for significantly intense reflections | 0.206 |
Weighted residual factors for all reflections included in the refinement | 0.2353 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.102 |
Diffraction radiation wavelength | 0.71069 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7026195.html
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