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Information card for entry 7027004
Preview
| Coordinates | 7027004.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C26 H18 N2 Ni2 S4 |
|---|---|
| Calculated formula | C26 H18 N2 Ni2 S4 |
| SMILES | [Ni]1234[Ni]56([S]2c2c([N]4=Cc4c(S1)cccc4)cccc2)Sc1ccccc1C=[N]6c1ccccc1[S]35 |
| Title of publication | Anion dependent deprotection of a thioether group in Schiff base NS2 ligands results in new mononuclear and dinuclear thiolato nickel complexes |
| Authors of publication | Bouwman, Elisabeth; Henderson, Richard K.; Powell, Annie K.; Reedijk, Jan; Smeets, Wilberth J. J.; Spek, Anthony L.; Veldman, Nora; Wocadlo, Sigrid |
| Journal of publication | Journal of the Chemical Society, Dalton Transactions |
| Year of publication | 1998 |
| Journal issue | 20 |
| Pages of publication | 3495 |
| a | 11.753 ± 0.003 Å |
| b | 11.9765 ± 0.0017 Å |
| c | 20.275 ± 0.004 Å |
| α | 90° |
| β | 123.665 ± 0.014° |
| γ | 90° |
| Cell volume | 2375.3 ± 0.9 Å3 |
| Cell temperature | 150 K |
| Ambient diffraction temperature | 150 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.1691 |
| Residual factor for significantly intense reflections | 0.0657 |
| Weighted residual factors for significantly intense reflections | 0.1205 |
| Weighted residual factors for all reflections included in the refinement | 0.161 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.972 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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