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Information card for entry 7043210
Preview
| Coordinates | 7043210.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C56 H72 Bi4 O10 S8 |
|---|---|
| Calculated formula | C56 H72 Bi4 O10 S8 |
| SMILES | C(C)(C)(c1cccs1)O[Bi]1(OC(C)(C)c2sccc2)[O]([Bi](OC(C)(C)c2cccs2)(OC(C)(C)c2sccc2)[O]1[Bi](OC(C)(C)c1sccc1)OC(C)(C)c1sccc1)[Bi](OC(C)(C)c1sccc1)OC(C)(C)c1sccc1 |
| Title of publication | Heteroaryl Bismuthines: A Novel Synthetic Concept and Metal···π Heteroarene Interaction |
| Authors of publication | Mehring, Michael; Preda, Ana Maria; Schneider, Wolfgang B.; Rainer, Martin; Rueffer, Tobias; Schaarschmidt, Dieter; Lang, Heinrich |
| Journal of publication | Dalton Trans. |
| Year of publication | 2017 |
| a | 10.3241 ± 0.0005 Å |
| b | 12.9973 ± 0.0008 Å |
| c | 14.0496 ± 0.0008 Å |
| α | 114.879 ± 0.006° |
| β | 101.803 ± 0.005° |
| γ | 99.558 ± 0.005° |
| Cell volume | 1605.3 ± 0.2 Å3 |
| Cell temperature | 100 K |
| Ambient diffraction temperature | 100 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0427 |
| Residual factor for significantly intense reflections | 0.0313 |
| Weighted residual factors for significantly intense reflections | 0.0763 |
| Weighted residual factors for all reflections included in the refinement | 0.0779 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.982 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7043210.html
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Users of the data should acknowledge the original authors of the
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