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Information card for entry 7050419
Preview
Coordinates | 7050419.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C16 H10 Fe2 Mo O6 S2 |
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Calculated formula | C16 H10 Fe2 Mo O6 S2 |
SMILES | [Mo]123456789([S]%10[Fe]%11([Fe]%10([S]1%11)(C#[O])(C#[O])C#[O])(C#[O])(C#[O])C#[O])([cH]1[cH]2[cH]5[cH]6[cH]81)[cH]1[cH]3[cH]4[cH]9[cH]71 |
Title of publication | Thin films by metal organic deposition of Fe‒Mo‒S molecular clusters: synthesis and crystal structure of [Cp2MoFe2(µ3-S)2(CO)6] |
Authors of publication | Auvray, Nicolas; Braunstein, Pierre; Mathur, Sanjay; Veith, Michael; Shen, Hao; Hüfner, Stefan |
Journal of publication | New Journal of Chemistry |
Year of publication | 2003 |
Journal volume | 27 |
Journal issue | 1 |
Pages of publication | 155 |
a | 8.217 ± 0.005 Å |
b | 13.703 ± 0.005 Å |
c | 16.31 ± 0.005 Å |
α | 90 ± 0.005° |
β | 92.176 ± 0.005° |
γ | 90 ± 0.005° |
Cell volume | 1835.1 ± 1.4 Å3 |
Cell temperature | 293 ± 2 K |
Ambient diffraction temperature | 293 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.0522 |
Residual factor for significantly intense reflections | 0.032 |
Weighted residual factors for significantly intense reflections | 0.1018 |
Weighted residual factors for all reflections included in the refinement | 0.1091 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.94 |
Diffraction radiation wavelength | 0.71069 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7050419.html
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Users of the data should acknowledge the original authors of the
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